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Fluoropolymer products with properties such as "UV-resistance" and "chemical resistance" are used.
AFLAS® is used in semiconductor equipment parts, applying properties such as its heat resistance and chemical resistance.
Fluon® ETFE is used in semiconductor equipment parts for its properties such as heat resistance and chemical resistance.
Fluon®ETFE is a tough fluoropolymer that has chemical resistance and electrical properties comparable to typical fluoropolymers, such as PTFE, PFA and FEP but performs better than ECTFE or PVdF because of its improved mechanical strength and moldability.
Fluon® PTFE is used in semiconductor equipment parts for its properties such as heat resistance and chemical resistance.
PTFE accounts for 60-70% of the total demand for fluoropolymers. Although discovered over 60 years ago, applications are still being explored in new fields due to its numerous desired properties such as inertness, lubricity and heat resistance.
Fluon® PFA is used in semiconductor equipment parts for its properties such as heat resistance and chemical resistance.
Fluon® PFA is a copolymer of tetrafluoroethylene (C2F4) and perfluoroalkoxyethylene. PFA retains inherent characteristics and similar properties to PTFE but can be processed using thermoplastic techniques, such as injection molding, extrusion, and blow molding.
Based on its properties of “oil and water repellency”, “chemical resistance”, “transparency” among others, it is used and considered for the production of “semiconductor equipment parts”.
Because CYTOP® has an amorphous structure, it can achieve extremely high transparency, and since it dissolves in an exclusive fluorine-based solvent, thin film coating is possible. Furthermore, it is a fluoropolymer with the characteristics including “transparency”, “low refractivity”, “electrical insulation”, “water and oil repellency”, and “chemical resistance”.